Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag
Tender Overview
Project Description
Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Magnetron, , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( B ) Cf-Based Flange Of Appropriate Size To Accommodate 3” Magnetron , , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( C ) Cf-Based Cluster Flange Of Appropriate Size To Accommodate 6” Dia. Magnetron Sources , Gate Valves: ( A ) Cf-63 / 2.5 Dia Flange Size, , Gate Valves: ( B ) Cf-100 / 4 Dia Flange Size, , Gate Valves: ( C ) Cf-200 / 8 Dia Flange Size , Deposition Chamber Pressure Measuring System , Rf Generator And Matching Network Of Power Rating ³1000 Watts @13.56 Mhz , Pulsed Dc Supplies Of Power Rating ³750 W , 3 Mass Flow Controllers , Turbo-Molecular Pump , Film Thickness Monitor , 4-Pocket And 4 Cc Electron Beam Evaporation Source With Tetrode Tube Based Power Supply 6 Kw And Having Digital Sweep
BOQ
| Sl. No. | Item Description |
| 1 | Large area Sputter coating unit components |
| 2 | Ultra-High Vacuum Compatible Sputter Magnetron Sources (a) CF-based flange of appropriate size to accommodate 2” magnetron, |
| 3 | Ultra-High Vacuum Compatible Sputter Magnetron Sources (b) CF-based flange of appropriate size to accommodate 3” magnetron , |
| 4 | Ultra-High Vacuum Compatible Sputter Magnetron Sources(c) CF-based cluster flange of appropriate size to accommodate 6” dia. magnetron sources |
| 5 | Gate Valves: (a) CF-63/2.5\" dia Flange size, |
| 6 | Gate Valves: (b) CF-100/4\" dia flange size, |
| 7 | Gate Valves: (c) CF-200/8\" dia flange size |
| 8 | Deposition chamber pressure measuring system |
| 9 | RF Generator and Matching Network of power rating ³1000 Watts @13.56 MHz |
| 10 | Pulsed DC Supplies of power rating ³750 W |
| 11 | 3 Mass Flow Controllers |
| 12 | Turbo-molecular pump |
| 13 | Film thickness monitor |
| 14 | 4-pocket and 4 cc electron beam evaporation source with Tetrode tube based power supply 6 kW and having digital sweep |
AI Tender Summary
Tender Timeline
Tender Published
Tender notice published.
CompletedBid Submission Deadline
Online submission via eProcurement portal.
CompletedBid Opening Date
Technical bids will be opened and evaluated.
Completed