Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag

Tender Notice

29050804
Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag
Indian
Delhi
01-09-2021
29-09-2021
30-09-2021

Tender Details

Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Magnetron, , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( B ) Cf-Based Flange Of Appropriate Size To Accommodate 3” Magnetron , , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( C ) Cf-Based Cluster Flange Of Appropriate Size To Accommodate 6” Dia. Magnetron Sources , Gate Valves: ( A ) Cf-63 / 2.5" Dia Flange Size, , Gate Valves: ( B ) Cf-100 / 4" Dia Flange Size, , Gate Valves: ( C ) Cf-200 / 8" Dia Flange Size , Deposition Chamber Pressure Measuring System , Rf Generator And Matching Network Of Power Rating ³1000 Watts @13.56 Mhz , Pulsed Dc Supplies Of Power Rating ³750 W , 3 Mass Flow Controllers , Turbo-Molecular Pump , Film Thickness Monitor , 4-Pocket And 4 Cc Electron Beam Evaporation Source With Tetrode Tube Based Power Supply 6 Kw And Having Digital Sweep

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BOQ Items

Name of Work:Large area Sputter coating unit components
Sl. No. Item Description
1Large area Sputter coating unit components
2Ultra-High Vacuum Compatible Sputter Magnetron Sources (a) CF-based flange of appropriate size to accommodate 2” magnetron,
3Ultra-High Vacuum Compatible Sputter Magnetron Sources (b) CF-based flange of appropriate size to accommodate 3” magnetron ,
4Ultra-High Vacuum Compatible Sputter Magnetron Sources(c) CF-based cluster flange of appropriate size to accommodate 6” dia. magnetron sources
5Gate Valves: (a) CF-63/2.5" dia Flange size,
6Gate Valves: (b) CF-100/4" dia flange size,
7Gate Valves: (c) CF-200/8" dia flange size
8Deposition chamber pressure measuring system
9RF Generator and Matching Network of power rating ³1000 Watts @13.56 MHz
10Pulsed DC Supplies of power rating ³750 W
113 Mass Flow Controllers
12Turbo-molecular pump
13Film thickness monitor
144-pocket and 4 cc electron beam evaporation source with Tetrode tube based power supply 6 kW and having digital sweep
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