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Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag, IIT Delhi, Hauz Khas, New Delhi-Delhi

Indian Institute Of Technology-IITB has published Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag. Submission Date for this Tender is 29-09-2021. Coats and Jackets Tenders in IIT Delhi, Hauz Khas, New Delhi Delhi. Bidders can get complete Tender details and download the document.




Tender Notice

29050804
Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag
Open Tender
Indian
Delhi
IIT Delhi, Hauz Khas, New Delhi
29-09-2021

Tender Details

Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Magnetron, , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( B ) Cf-Based Flange Of Appropriate Size To Accommodate 3” Magnetron , , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( C ) Cf-Based Cluster Flange Of Appropriate Size To Accommodate 6” Dia. Magnetron Sources , Gate Valves: ( A ) Cf-63 / 2.5 Dia Flange Size, , Gate Valves: ( B ) Cf-100 / 4 Dia Flange Size, , Gate Valves: ( C ) Cf-200 / 8 Dia Flange Size , Deposition Chamber Pressure Measuring System , Rf Generator And Matching Network Of Power Rating ³1000 Watts @13.56 Mhz , Pulsed Dc Supplies Of Power Rating ³750 W , 3 Mass Flow Controllers , Turbo-Molecular Pump , Film Thickness Monitor , 4-Pocket And 4 Cc Electron Beam Evaporation Source With Tetrode Tube Based Power Supply 6 Kw And Having Digital Sweep

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BOQ Items

Name of Work:Large area Sputter coating unit components
Sl. No. Item Description
1Large area Sputter coating unit components
2Ultra-High Vacuum Compatible Sputter Magnetron Sources (a) CF-based flange of appropriate size to accommodate 2” magnetron,
3Ultra-High Vacuum Compatible Sputter Magnetron Sources (b) CF-based flange of appropriate size to accommodate 3” magnetron ,
4Ultra-High Vacuum Compatible Sputter Magnetron Sources(c) CF-based cluster flange of appropriate size to accommodate 6” dia. magnetron sources
5Gate Valves: (a) CF-63/2.5" dia Flange size,
6Gate Valves: (b) CF-100/4" dia flange size,
7Gate Valves: (c) CF-200/8" dia flange size
8Deposition chamber pressure measuring system
9RF Generator and Matching Network of power rating ³1000 Watts @13.56 MHz
10Pulsed DC Supplies of power rating ³750 W
113 Mass Flow Controllers
12Turbo-molecular pump
13Film thickness monitor
144-pocket and 4 cc electron beam evaporation source with Tetrode tube based power supply 6 kW and having digital sweep
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