Tender Overview
Project Description
Supply of plasma enhanced chemical cap-or deposition system, magnetron sputtering 01 no., reactive Ion etching RIE), thichness profilometer, modular hotolu-minescence system, chemical balance, high resolution, high resolution field emission scanning electron microscope.
Tender Timeline
Tender Published
Tender notice published.
CompletedBid Submission Deadline
Online submission via eProcurement portal.
CompletedBid Opening Date
Technical bids will be opened and evaluated.
CompletedTender Documents
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