Tenders Are Invited For Instruments For Checking Physical Characteristics – Procurement Of A Dedicated Electron Beam Lithography System

Instruments For Checking Physical Characteristics – Procurement Of A Dedicated Electron Beam Lithography System. The Nanoscale Structuring Of Quantum Components Is Required For The Spatial Localization Of Quantum Physical Phenomena. The Lateral Resolution Power Of Optical Methods Is Severely Limited By The Wavelength Of The Light In Refractive Optics And Its Diffraction Behavior, Which Is Why Alternative Methods Are Used. Electron Beam Lithography (Hereinafter Abbreviated As Ebl) Is Of Particular Importance Here Because, In Addition To An Extremely High Resolution Of Potentially A Few Nanometers, Relatively Short Exposure Times And A High Level Of Compatibility, It Is Used In Quantum Technology Upcoming Material Systems Can Be Easily Integrated Into Process Sequences With Photolithographically Pre-Structured Samples (Mix And Match). As Part Of The Munich Quantum Valley Initiative, The Efetov Chair, Ludwig Maximilian University Of Munich, Faculty Of Physics, Will Produce A Variety Of Novel Two-Dimensional Materials And Examine Them For Their Electrical, Magnetic, Optical And Thermal Properties At Extremely Low Temperatures. Structures With Dimensions In The Nanoscale Range Are Essential For This. To Fulfill This Task, A Dedicated Ebl System With High Acceleration Voltage (At Least 50 Kv), Electrostatic Beam Deflection With Fast Scanning Electronics (At Least 50 Mhz), A Stage With High-Precision, Laser Interferometric Positioning For Exact Superimposition (Overlay) Of Successive Structuring Steps And The Connection Of Neighboring Writing Fields (Stitching) Is Required.