Tenders Are Invited For Research, Testing And Scientific Technical Simulator - Supply Of Optical Lithography Equipment Without A Mask, As Part Of La1, A2 And A3, Collaboration Agreement Between The Government Of Aragon, University Of Zaragoza And Itainnova For The Execution Of Lines Of Action Of R&D&I, Financed By The European Union Nextgenerationeu/Prtr, Within The Framework Of The Complementary Plans Provided For In The Recovery, Transformation And Resilience Plan-Mrr.
Tenders Are Invited For Research, Testing And Scientific Technical Simulator - Supply Of Optical Lithography Equipment Without A Mask, As Part Of La1, A2 And A3, Collaboration Agreement Between The Government Of Aragon, University Of Zaragoza And Itainnova For The Execution Of Lines Of Action Of R&D&I, Financed By The European Union Nextgenerationeu/Prtr, Within The Framework Of The Complementary Plans Provided For In The Recovery, Transformation And Resilience Plan-Mrr.
Research, Testing And Scientific Technical Simulator - Supply Of Optical Lithography Equipment Without A Mask, As Part Of La1, A2 And A3, Collaboration Agreement Between The Government Of Aragon, University Of Zaragoza And Itainnova For The Execution Of Lines Of Action Of R&D&I, Financed By The European Union Nextgenerationeu/Prtr, Within The Framework Of The Complementary Plans Provided For In The Recovery, Transformation And Resilience Plan-Mrr.. The Acquisition Of Equipment For The Preparation Of Micro And Nano Devices That Can Serve The Three Lines Of Action Of The Complementary Materials Plan Advanced: La1.Graphene And Other Two-Dimensional Materials La2. Materials For Energy And La3 Smart Materials With Advanced Functionalities. The Target Equipment Of The Contract Has Applications In Microelectronics And Semiconductors, Spintronics, Mems, Sensors, Microfluidics, Nanotechnology, Graphene And Other 2D Materials, Among Others, So It Will Cover This Need. This High-Quality Optical Lithography Equipment Features Offers Great Versatility Since It Can Be Used Both To Manufacture Masks For Prototyping On Almost Any Type Of Substrate, Photomasks, Semiconductors, Glass, Polymers, Crystals, Flexible Films, Being Able To Define Motifs With A Size Less Than 500 Nanometers. Finally, Due To Its High Versatility And Flexibility Is Considered A Very Useful Tool To Meet The Objective Mentioned Of Establishing Collaborations, Creating Synergies, And Aligning Fund Execution Between Autonomous Communities.
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