Tenders Are Invited For Supply Ale-Ald Equipment For 200Mm Wafers

Supply Ale-Ald Equipment For 200Mm Wafers. The Irig Research Institute Of Cea Grenoble Wishes To Acquire An Aleald Cluster For The Fabrication Of Semiconductor Devices For Quantum Computing. The Equipment Must Allow The Processing Of Wafers Of 200 Mm And Smaller. The Equipment Will Consist Of Two Chambers, Connected Under Vacuum By A Robotic Arm, Into Which The Wafers Will Be Loaded Via A Loading Lock. The First Chamber Will Be Dedicated To The Etching Of Semiconductor Materials, Silicon And Germanium, Their Alloys And Their Oxides. Etching Is Done By Atomic Layer Etching (Ale). The Second Chamber Will Be Dedicated To The Deposition Of Oxide And Nitride Materials, Aluminum Oxide, Silicon Oxide, Titanium Nitride, Aluminum Nitride And Niobium Nitride.