Tenders Are Invited For Electron-Beam Lithography

Electron-Beam Lithography. The Objective Is To Purchase An Electron Beam Lithography (Ebl) System. The Ebl System Should Be Capable Of Pattern Resists At The Nanoscale For Fabrication Of Desired Nanostructured Surfaces Of Various Materials And On Various Types And Sizes Of Substrates.Scope And Objectivethe Objective Is To Purchase An Electron Beam Lithography (Ebl) System. The Ebl System Should Be Capable Of Pattern Resists At The Nanoscale For Fabrication Of Desired Nanostructured Surfaces Of Various Materials And On Various Types And Sizes Of Substrates.A More Detailed Description Of The Procurement Object And The Requirements Is Presented In Chapter 2, Specification Of Requirements.A Contract, Consisting Of The Purchase Contract And A Service Contract, (The Contract) Will Be Signed With One (1) Supplier.