Tenders Are Invited For Machines And Apparatus With Individual Functions – Procurement Procedure For The Delivery Of An Atomic Layer Deposition Facility (Ald)

Machines And Apparatus With Individual Functions – Procurement Procedure For The Delivery Of An Atomic Layer Deposition Facility (Ald). The Tender Is For The Delivery And Ready-To-Use Handover Including Functional Testing, Instruction And Acceptance Of A System For Both Thermal And Plasma-Assisted Atomic Layer Deposition (Ald) Of High-Precision Thin Films On Three-Dimensionally Pre-Structured And Planar Substrates With Controlled Layer Thicknesses In The Nanometer Range. The Planned System Is Intended To Enable The Deposition Of Superconducting Films Of The Highest Quality, In Particular Niobium Nitrite, Dielectric Thin Films As Well As Magnetic Materials And High-K Dielectrics. The Device Should Be Equipped With Precise In-Situ Layer Thickness Monitoring To Enable Optimal Process Control. The Service Offered Includes The Following Items: - Offer And Delivery Of A New Device Or New Product - Timely Delivery Free Curbside Including Unloading - Functional Test Or Demonstration As Well As Instruction And Commissioning. - Acceptance Of The Device At The Customers Site - On-Site Training (3 Days Of 8 Hours Each) For 2 Employees From Heidelberg University. Due To The Requirements Of The Approval Process For Large Equipment, The Maximum Financial Resources Available Are Limited And End At Eur 1,039,000 (Including Vat Or Comparable, Customs Duties And Any Discounts). Offers That Exceed This Limit Cannot Be Considered. The Vat And Customs Duties To Be Stated Are Part Of The Limit Value.