Tenders Are Invited For Microelectronic Machinery And Apparatus And Microsystems – Supply Of Direct Laser Writing (Dlw) Lithography System

Microelectronic Machinery And Apparatus And Microsystems – Supply Of Direct Laser Writing (Dlw) Lithography System. The Purpose Of This Report Is To Justify The Need And Suitability Of The Contract For The Supply, Installation, Commissioning, Validation And Training Associated With A Direct Laser Writing Lithography System (Direct Laser Writing, Dlw), In Accordance With The Provisions Of Article 28 Of Law 9/2017, Of November 8, On Public Sector Contracts (Lcsp), By Which The Directives Of The European Parliament And The Council Are Transposed Into The Spanish Legal System. 2014/23/Eu And 2014/24/Eu, Of February 26, 2014, As Well As The Corresponding Provisions That Require The Preparation Of A Report On The Insufficiency Of Means, Necessity And Suitability Of The Contract Prior To The Start Of The Contracting File. The Equipment Will Be Allocated To The Singular Scientific And Technical Infrastructure (Icts) Micronanofabs, A Spanish Network Of Micro And Nanofabrication Clean Rooms Integrated Into The National Icts Map Of The Ministry Responsible For Science, Of Which The Micro And Nano Manufacturing Infrastructure Of The Nanophotonic Technology Center (Ntc) Of The Universitat Politècnica De València (Upv) Is A Part, Together With The National Microelectronics Center (Csic) And The Isom Technology Center (Upm). The Installation Will Be Located In The White Room Of Building 8F Of The Ntc-Upv. The Nanophotonics Technology Center Develops Research And Manufacturing Activities In The Fields Of Integrated Photonics, Nanotechnology, Biosensing, Micro-Optics And Microfluidic Systems. Commonly Manufactured Devices Include Photonic Integrated Circuits (Pics), Photonic Biosensors, Nanoantennas, Optical Resonators, Photonic Crystals, Diffractive Optical Elements, Metallenses And Microlenses, Three-Dimensional Structures Obtained By Gray Scale Lithography, Mems Devices, Microfluidic Systems, And Photonic Hybrid Components And Packages. These Devices Require Combining Manufacturing Processes With Nanometer And Micrometer Resolutions, High Levels Of Geometric Precision, Multilayer Alignment And High Productivity That Allows The Manufacture Of Complete Devices And Wafers In Times Compatible With Research Activity And The Provision Of Technological Services. Therefore, It Is Necessary To Acquire A Lithography System That Simultaneously Offers High Resolution, High Writing Speed, Mechanical Stability, Positioning Precision And Versatility To Work On A Wide Variety Of Materials And Substrate Sizes. As Icts Integrated Into The Micronanofabs Network, The Ntc-Upv Provides Micro- And Nanomanufacturing Services To National And International Research Groups, As Well As Companies, Within The Framework Of Competitive Projects, Technology Transfer Contracts And Provision Of Advanced Services. The Equipment Will Be Part Of The Centers Scientific Infrastructure And Will Be Used For The Development Of