Tenders Are Invited For Laboratory, Optical And Precision Equipments (Excl. Glasses) – Plasma Equipment For Reactive Ion Etching Of Metals For The Micronanotechnology Center

Laboratory, Optical And Precision Equipments (Excl. Glasses) – Plasma Equipment For Reactive Ion Etching Of Metals For The Micronanotechnology Center. Epfl Intends To Acquire Plasma Equipment For Reactive Ion Etching Of Metals For Its Center For Micronanotechnology (Cmi), In Order To Process Both Square Photomasks And Standard Wafers, And Of Various Possible Dimensions. The Cmi Is A Clean Room Installation Dedicated To Micro/Nano Manufacturing, Central For All Epfl Faculties, As Well As For Local Manufacturers (>650 Active Users Per Year). This Equipment Will Be Dedicated To Cutting-Edge Research Needs In Micro And Nano Manufacturing, And More Particularly To The Etching Of Chromium Layers Deposited On Lithography Masks/Reticles As Well As On Wafers. Great Importance Will Be Given Not Only To The Quality Of The Engravings, But Also To How Cross-Contamination Between Different Materials Is Avoided As A Second Key Element For The Flexibility Of Use Planned For This Equipment. The Ease Of Use Of The Equipment, Its Simplicity/Speed Of Learning For New Users And Its Flexible Yet Robust Ability To Control Etching Processes In A Typical R&D Environment Are Also Of Great Importance. The Proximity, Responsiveness Of The Supplier And The Support Available (Technical, Processes) Will Be Evaluated.