Tenders Are Invited For Laboratory, Optical And Precision Equipments (Excl. Glasses) – Chemical-Mechanical Polishing Machine

Laboratory, Optical And Precision Equipments (Excl. Glasses) – Chemical-Mechanical Polishing Machine. The Friedrich Schiller University Jena Intends To Purchase A Chemical-Mechanical Polishing Machine (Cmp) For Polishing Semiconductor And Dielectric Surfaces For Optical Applications For Its Scientific Activities. It Must Be Suitable For Sample Sizes Up To Wafers (Semiconductor Disks) With Diameters Of Up To 100 Millimeters And Be Able To Achieve Roughnesses Of Less Than 1 Nanometer (Rms Roughness). This Results In The Following Minimum Requirements: See Appendix 2 The Awarding Authority Reserves The Right To Exclude Offers From The Evaluation With A Total Contract Value Of 225,000.00 Euros Net. If All Offers Are Above This Limit, The Awarding Authority Is Entitled To Cancel The Tender.