Tenders Are Invited For Laboratory, Optical And Precision Equipments (Excl. Glasses) – Procurement Procedure For The Delivery Of A Vapor Phase Deposition System

Laboratory, Optical And Precision Equipments (Excl. Glasses) – Procurement Procedure For The Delivery Of A Vapor Phase Deposition System. The Tender Is For The Delivery And Ready-To-Use Handover Including Functional Testing, Instruction And Acceptance Of A System For Plasma-Enhanced Chemical Vapor Deposition (Pecvd) With An Inductively Coupled Plasma Source (Icp) For The Production Of High-Quality Material Films With Precisely Defined Layer Thicknesses In The Nanometer-Micrometer Range. The Planned Icp-Pecvd System Is Intended To Enable The Targeted Deposition Of Dielectric Thin Films With Controllable Optical Properties And Precisely Controllable Layer Thicknesses Through In-Situ Monitoring. High-Quality Dielectric Layers For Optical Passivation, Optical Waveguides And Multilayer Systems As Well As Hard Masks For High-Resolution Lithography Processes Are To Be Deposited. As Part Of Our Research Work, Silicon Dioxide, Silicon Nitride, Amorphous Silicon And Diamond-Like Carbon Layers Should Be Able To Be Deposited In An Optimized Manner Using A New System. Due To The Requirements Of The Approval Process For Large Equipment, The Maximum Financial Resources Available Are Limited And End At Eur 806,000 (Including Vat Or Comparable, Customs Duties And Any Discounts). Offers That Exceed This Limit Cannot Be Considered. Vat And Customs Duties To Be Stated Are Part Of The Limit Value. The Service Offered Includes The Following Items: - Offer And Delivery Of A New Device Or New Product - Timely Delivery And Complete Installation At The Point Of Use. - Disposal Of Packaging And Surplus Components. - Functional Test Or Demonstration As Well As Instruction And Commissioning. - Acceptance Of The Device At The Customers Site - On-Site Training (3 Days Of 8 Hours Each) For 2 Employees From Heidelberg University.