Tenders Are Invited For Laboratory, Optical And Precision Equipments (Excl. Glasses) – European Tender Electron Beam Lithography System

Laboratory, Optical And Precision Equipments (Excl. Glasses) – European Tender Electron Beam Lithography System. The University Of Twente Is Tendering To Purchase An Electron Beam Lithography System. The Mesa+ Institute Of The University Of Twente Will Invest In A New Electron Beam System (E-Beam System). A System, Suitable For Defining Patterns In Electron Sensitive Resists, At High Resolution And High Speed, Compatible With A Wide Range Of Applications And Substrate Types Up To 200Mm In Diameter. The System Will Be Used By A Wide Range Of Users, I.E. Academic Researchers And Students As Well As Industrial Engineers With Different Backgrounds (Photonics, (Nano)-Electronics Etc.) And Different Levels Of Expertise.