Tenders Are Invited For Laboratory, Optical And Precision Equipment (Excl. Glasses) – Hotplate For Tempering Large-Area Substrates For Electron Beam Lithography

Laboratory, Optical And Precision Equipment (Excl. Glasses) – Hotplate For Tempering Large-Area Substrates For Electron Beam Lithography. A Semi-Automatic Hotplate Is To Be Purchased For Annealing Substrates Coated With Resists For High-Resolution Electron Beam Lithography. The System Is Used For The Defined Pre- And Post-Bake Of Chemically Amplified Resists, Such As Fep171, Where The Sensitivity Is Essentially Determined By The Temperature-Time Profile And The Temperature Homogeneity. Substrates To Be Processed Include, Among Others, 300Mm Wafers, As Well As Rectangular Glass Substrates Up To L X W X H = 300Mm × 275Mm × 15Mm. These Technical Boundary Conditions Result In The Following Requirements: See Appendix 2.