Tenders Are Invited For 1 Low-Temperature And High-Vacuum Micron-Level Indium Plating And Argon Ion Etching System

Tender Detail

108004421
T-115002
Self-Funded
Tenders Are Invited For 1 Low-Temperature And High-Vacuum Micron-Level Indium Plating And Argon Ion Etching System
NCB
Eastern Asia
APAC (Asia Pacific)
09-02-2026

Work Detail

1 low-temperature and high-vacuum micron-level indium plating and argon ion etching system

Key Value

Tender Value
45,00,000 - TWD

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Global Tender Document eea23938-3502-48c8-a400-f0cd8ee52861.html
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