Contract Notice: Ultra-High-Vacuum Chamber For Thin-Film Synthesis Laboratory, Optical And Precision Equipments (Excl. Glasses) Short Description: The Helsinki Accelerator Laboratory (Hal) At The Department Of Physics Of The University Of Helsinki (Uh) Is Going To Acquire A Multi-Source Ultra-High-Vacuum (Uhv) Chamber For Thin-Film Synthesis Using Magnetron Sputtering And Thermal Evaporation. The Magnetron Sources Will Be Capable Of Operating In Direct-Current Magnetron Sputtering (Dcms), Radio-Frequency Magnetron Sputtering (Rfms), And High-Power Impulse Magnetron Sputtering (Hipims) Modes. Moreover, The Chamber Layout Will Allow For Performing In Situ And Real-Time Measurements Of Film Optical Properties (Via Spectroscopic Ellipsometry) And Mechanical Stresses (Via Laser Deflection Techniques). Rfms And Hipims Power Supplies, As Well As Instrumentation For Spectroscopic Ellipsometry And Mechanical Stress Measurements Are Not Part Of This Tender. Deadline For Submission: 20220520 14:00 Type Of Buyer: Body Governed By Public Law Type Of Contract: Supplies Type Of Procedure: Open Procedure Regulation: European Union, With Participation By Gpa Countries Type Of Bid: Submission For All Lots Award Criteria: The Most Economic Tender
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